An absorption device for rotatable heating is provided with an absorption heating plate (102), a support needle driving device (103), a rotary sliding ring (104) and a turning shaft (107). The absorption heating plate (102) is amounted at the top of the turning shaft (107), and a wafer (101) is arranged at the top of the absorption heating plate (102). The rotary sliding ring (104) is connected to the turning shaft (107) in which a vacuum channel and a connection wire channel are arranged. Support needles (111) are connected to the output end of the support needle driving device (103), run through the absorption heating plate (102) and are arranged at the bottom of the wafer (101) uniformly. The absorption device incorporates the wafer absorption function, the wafer rotating function with controllable speed and the heating function for heating the wafer to reach different temperature according to the different requirement, which solves the problem of absorption and heating rotation at the same time.