发明申请
- 专利标题: MEMORY DEVICE
- 专利标题(中): 内存设备
-
申请号: US13599504申请日: 2012-08-30
-
公开(公告)号: US20130228736A1公开(公告)日: 2013-09-05
- 发明人: Daisuke MATSUSHITA , Shosuke Fujii , Yoshifumi Nishi , Akira Takashima , Takayuki Ishikawa , Hidenori Miyagawa , Takashi Haimoto , Yusuke Arayashiki , Hideki Inokuma
- 申请人: Daisuke MATSUSHITA , Shosuke Fujii , Yoshifumi Nishi , Akira Takashima , Takayuki Ishikawa , Hidenori Miyagawa , Takashi Haimoto , Yusuke Arayashiki , Hideki Inokuma
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 优先权: JP2012-018006 20120131; JP2012-066109 20120322
- 主分类号: H01L45/00
- IPC分类号: H01L45/00
摘要:
According to one embodiment, a memory device includes a first electrode, a second electrode, and a variable resistance film. The variable resistance film is connected between the first electrode and the second electrode. The first electrode includes a metal contained in a matrix made of a conductive material. A cohesive energy of the metal is lower than a cohesive energy of the conductive material. A concentration of the metal at a central portion of the first electrode in a width direction thereof is higher than concentrations of the metal in two end portions of the first electrode in the width direction.
公开/授权文献
- US08664632B2 Memory device 公开/授权日:2014-03-04
信息查询
IPC分类: