发明申请
- 专利标题: FERROELECTRIC THIN FILM HAVING SUPERLATTICE STRUCTURE, MANUFACTURING METHOD THEREOF, FERROELECTRIC ELEMENT, AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 具有超导结构的电解薄膜,其制造方法,电磁元件及其制造方法
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申请号: US13878571申请日: 2011-10-04
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公开(公告)号: US20130244016A1公开(公告)日: 2013-09-19
- 发明人: Minoru Osada , Takayoshi Sasaki
- 申请人: Minoru Osada , Takayoshi Sasaki
- 优先权: JP2010-230132 20101013
- 国际申请: PCT/JP2011/072844 WO 20111004
- 主分类号: H01L41/18
- IPC分类号: H01L41/18 ; C30B19/06
摘要:
At least two types of dielectric materials such as oxide nanosheets having a layered perovskite structure that differ from each other are laminated, and the nanosheets are bonded to each other via an ionic material, thereby producing a superlattice structure-having ferroelectric thin film. Having the layered structure, the film can exhibit ferroelectricity as a whole, though not using a ferroelectric material therein. Accordingly, there is provided a ferroelectric film based on a novel principle, which is favorable for ferroelectric memories and others and which is free from a size effect even though extremely thinned.