发明申请
US20130244408A1 Systems And Methods For Growing A Non-Phase Separated Group-III Nitride Semiconductor Alloy
有权
用于生长非相分离III族氮化物半导体合金的系统和方法
- 专利标题: Systems And Methods For Growing A Non-Phase Separated Group-III Nitride Semiconductor Alloy
- 专利标题(中): 用于生长非相分离III族氮化物半导体合金的系统和方法
-
申请号: US13883566申请日: 2011-11-08
-
公开(公告)号: US20130244408A1公开(公告)日: 2013-09-19
- 发明人: Michael William Moseley , William Alan Doolittle
- 申请人: Michael William Moseley , William Alan Doolittle
- 申请人地址: US GA Atlanta
- 专利权人: GEORGIA TECH RESEARCH CORPORATION
- 当前专利权人: GEORGIA TECH RESEARCH CORPORATION
- 当前专利权人地址: US GA Atlanta
- 国际申请: PCT/US11/59793 WO 20111108
- 主分类号: H01L21/205
- IPC分类号: H01L21/205
摘要:
Systems and methods for MBE growing of group-III Nitride alloys, comprising establishing an average reaction temperature range from about 250 C to about 850 C; introducing a nitrogen flux at a nitrogen flow rate; introducing a first metal flux at a first metal flow rate; and periodically stopping and restarting the first metal flux according to a first flow duty cycle. According to another embodiment, the system comprises a nitrogen source that provides nitrogen at a nitrogen flow rate, and, a first metal source comprising a first metal effusion cell that provides a first metal at a first metal flow rate, and a first metal shutter that periodically opens and closes according to a first flow duty cycle to abate and recommence the flow of the first metal from the first metal source. Produced alloys include AlN, InN, GaN, InGaN, and AlInGaN.
公开/授权文献
信息查询
IPC分类: