Invention Application
- Patent Title: DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
-
Application No.: US13900903Application Date: 2013-05-23
-
Publication No.: US20130256892A1Publication Date: 2013-10-03
- Inventor: Shunpei YAMAZAKI , Mitsuaki OSAME
- Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Applicant Address: JP Atsugi-shi
- Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee Address: JP Atsugi-shi
- Priority: JP2002-276295 20020920
- Main IPC: H01L23/532
- IPC: H01L23/532

Abstract:
It is an object of the present invention to prevent an influence of voltage drop due to wiring resistance, trouble in writing of a signal into a pixel, and trouble in gray scales, and provide a display device with higher definition, represented by an EL display device and a liquid crystal display device.In the present invention, a wiring including Cu is provided as an electrode or a wiring used for the display device represented by the EL display device and the liquid crystal display device. Besides, sputtering is performed with a mask to form the wiring including Cu. With such structure, it is possible to reduce the voltage drop and a deadened signal.
Public/Granted literature
- US08749061B2 Display device and manufacturing method thereof Public/Granted day:2014-06-10
Information query
IPC分类: