发明申请
- 专利标题: CVD REACTOR CLEANING METHODS AND SYSTEMS
- 专利标题(中): CVD反应器清洗方法和系统
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申请号: US13441127申请日: 2012-04-06
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公开(公告)号: US20130263895A1公开(公告)日: 2013-10-10
- 发明人: Jae Chull Lee , Jong Hyuck Lee , Jae Min Lee , Jung Hun Lee
- 申请人: Jae Chull Lee , Jong Hyuck Lee , Jae Min Lee , Jung Hun Lee
- 主分类号: B08B9/08
- IPC分类号: B08B9/08
摘要:
A portable cleaning system for a CVD reactor. The cleaning system comprises two components: (1) a stand-mounted gloved box assembly for mounting a flow flange or shower head of a CVD reactor thereto, and (2) a gloved device such as a gloved flange or gloved cylinder for mounting to the reactor chamber. Both components can be equipped with a filtration device for capturing particles that are cleaned out of the CVD reactor. Both systems can be purged with an inert gas to guard against pyrophoric reactions. The system can be used for cleaning existing CVD reactors without the need for costly modification of the CVD reactor to accommodate the cleaning equipment. Also, one cleaning system can be used to service several CVD reactors.
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