发明申请
US20130265530A1 DISPLAY DEVICE AND THIN FILM TRANSISTOR SUBSTRATE AND MANUFACTURING METHOD THEREFOR
审中-公开
显示器件和薄膜晶体管衬底及其制造方法
- 专利标题： DISPLAY DEVICE AND THIN FILM TRANSISTOR SUBSTRATE AND MANUFACTURING METHOD THEREFOR
- 专利标题（中）： 显示器件和薄膜晶体管衬底及其制造方法
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申请号： US13994774申请日： 2011-12-14
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公开(公告)号： US20130265530A1公开(公告)日： 2013-10-10
- 发明人: Yasumori Fukushima , Noriko Watanabe , Kenji Misono , Masaki Fujiwara
- 申请人： Yasumori Fukushima , Noriko Watanabe , Kenji Misono , Masaki Fujiwara
- 申请人地址： JP Osaka-shi, Osaka
- 专利权人： SHARP KABUSHIKI KAISHA
- 当前专利权人： SHARP KABUSHIKI KAISHA
- 当前专利权人地址： JP Osaka-shi, Osaka
- 优先权： JP2010-285109 20101221
- 国际申请： PCT/JP2011/006996 WO 20111214
- 主分类号： G02F1/13363
- IPC分类号： G02F1/13363
摘要：
A display device includes a TFT substrate (30) containing a transparent first resin substrate (11) having the heat resistance and a plurality of TFTs (5) disposed on the first resin substrate (11) and a counter-substrate (50) containing a transparent second resin substrate (41) having the heat resistance and being disposed opposing to the TFT substrate (30), wherein the first resin substrate (11) and the second resin substrate (41) have a thickness of 5 μm or more and 20 μm or less and a birefringence of 0.002 or more and 0.1 or less.
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