Invention Application
- Patent Title: SOLAR CELL WAFER AND METHOD OF PRODUCING THE SAME
- Patent Title (中): 太阳能电池槽及其制造方法
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Application No.: US13261672Application Date: 2012-01-18
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Publication No.: US20130291925A1Publication Date: 2013-11-07
- Inventor: Shigeru Okuuchi
- Applicant: Shigeru Okuuchi
- Priority: JP2011-014496 20110126; JP2011-123295 20110601
- International Application: PCT/JP2012/051482 WO 20120118
- Main IPC: H01L31/052
- IPC: H01L31/052 ; H01L31/18

Abstract:
A solar cell wafer having a porous layer on a surface of a semiconductor wafer typified by a silicon wafer, which can further reduce reflection loss of light at the surface. A solar cell wafer 100 of the present invention has a porous layer 11 having a pore diameter of 10 nm or more and 45 nm or less, on at least one surface 10A of a semiconductor wafer 10, and the layer thickness of the porous layer 11 is more than 50 nm and 450 nm or less.
Public/Granted literature
- US09276153B2 Solar cell wafer and method of producing the same Public/Granted day:2016-03-01
Information query
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