发明申请
US20130306238A1 CHEMICAL LIQUID PREPARATION METHOD OF PREPARING A CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, CHEMICAL LIQUID PREPARATION UNIT PREPARING A CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, AND SUBSTRATE PROCESSING SYSTEM
审中-公开
化学液体制备方法，用于制备用于基板处理的化学液体，化学液体制备单元，用于制备用于基板处理的化学液体和基板处理系统
- 专利标题： CHEMICAL LIQUID PREPARATION METHOD OF PREPARING A CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, CHEMICAL LIQUID PREPARATION UNIT PREPARING A CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, AND SUBSTRATE PROCESSING SYSTEM
- 专利标题（中）： 化学液体制备方法，用于制备用于基板处理的化学液体，化学液体制备单元，用于制备用于基板处理的化学液体和基板处理系统
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申请号： US13835073申请日： 2013-03-15
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公开(公告)号： US20130306238A1公开(公告)日： 2013-11-21
- 发明人: Atsuyasu MIURA , Hidekazu ISHIKAWA
- 申请人： DAINIPPON SCREEN MFG. CO., LTD.
- 申请人地址： JP Kyoto
- 专利权人： DAINIPPON SCREEN MFG. CO., LTD.
- 当前专利权人： DAINIPPON SCREEN MFG. CO., LTD.
- 当前专利权人地址： JP Kyoto
- 优先权： JP2012-111758 20120515; JP2013-025312 20130213
- 主分类号： B01F1/00
- IPC分类号： B01F1/00 ; C09K13/00
摘要：
A substrate processing system includes a chemical liquid preparation unit preparing a chemical liquid to be supplied to a substrate and a processing unit which supplies the chemical liquid, prepared by the chemical liquid preparation unit, to the substrate. The chemical liquid preparation unit supplies an oxygen-containing gas, containing oxygen gas, to a TMAH-containing chemical liquid, containing TMAH (tetramethylammoniumhydroxide),tomaketheoxygen-containing gas dissolve in the TMAH-containing chemical liquid.
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