Invention Application
- Patent Title: ELECTROSTATIC CHUCK AND MANUFACTURING METHOD THEREOF
- Patent Title (中): 静电切割及其制造方法
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Application No.: US13948921Application Date: 2013-07-23
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Publication No.: US20130306593A1Publication Date: 2013-11-21
- Inventor: Tsuyoshi HIDA , Takashi YAMAMOTO
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Priority: JP2008-085417 20080328
- Main IPC: H01L21/683
- IPC: H01L21/683

Abstract:
An electrostatic chuck of a stack structure includes a metal layer interposed between insulating layers and a groove formed at a peripheral portion of the electrostatic chuck to have a thickness gradually increasing toward an outside, the groove being covered with a thermally sprayed insulating film. The thermally sprayed film covers at least a portion of the metal layer exposed at an inside of the groove such that the thermally sprayed film does not protrude from the groove.
Public/Granted literature
- US08776356B2 Electrostatic chuck and manufacturing method thereof Public/Granted day:2014-07-15
Information query
IPC分类: