Invention Application
US20130323909A1 METHOD FOR FABRICATING SEMICONDUCTOR COMPONENTS HAVING LASERED FEATURES CONTAINING DOPANTS
有权
用于制备具有包含多晶硅的激光特征的半导体元件的方法
- Patent Title: METHOD FOR FABRICATING SEMICONDUCTOR COMPONENTS HAVING LASERED FEATURES CONTAINING DOPANTS
- Patent Title (中): 用于制备具有包含多晶硅的激光特征的半导体元件的方法
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Application No.: US13960855Application Date: 2013-08-07
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Publication No.: US20130323909A1Publication Date: 2013-12-05
- Inventor: Alan G. Wood , Tim Corbett
- Applicant: MICRON TECHNOLOGY, INC.
- Applicant Address: US ID Boise
- Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee: MICRON TECHNOLOGY, INC.
- Current Assignee Address: US ID Boise
- Main IPC: H01L21/22
- IPC: H01L21/22

Abstract:
A method for fabricating semiconductor components includes the steps of providing a semiconductor substrate having a circuit side, a back side and integrated circuits and circuitry on the circuit side; thinning the substrate from the back side to a selected thickness to form a thinned substrate; applying a dopant to the back side of the thinned substrate; and laser processing the back side of the thinned substrate to form a plurality of patterns of lasered features containing the dopant. The dopant can be selected to modify properties of the semiconductor substrate such as carrier properties, gettering properties, mechanical properties or visual properties.
Public/Granted literature
- US08728921B2 Method for fabricating semiconductor components having lasered features containing dopants Public/Granted day:2014-05-20
Information query
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