发明申请
- 专利标题: Die Edge Contacts for Semiconductor Devices
- 专利标题(中): 半导体器件的边缘触点
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申请号: US13967165申请日: 2013-08-14
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公开(公告)号: US20130328215A1公开(公告)日: 2013-12-12
- 发明人: Yi-Jen Lai , You-Hua Chou , Hon-Lin Huang , Huai-Tei Yang
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
A semiconductor device utilizing die edge contacts is provided. An integrated circuit die has a post-passivation layer with a trench filled with a conductive material extending from a contact to a die edge, thereby forming a die edge contact. Optionally, a through substrate via may be positioned along the die edge such that the conductive material in the trench is electrically coupled to the through-substrate via, thereby forming a larger die edge contact. The integrated circuit die may be placed in a multi-die package wherein the multi-die package includes walls having a major surface perpendicular to a major surface of the integrated circuit die. The die edge contacts are electrically coupled to contacts on the walls of the multi-die package. The multi-die package may include edge contacts for connecting to another substrate, such as a printed circuit board, a packaging substrate, a high-density interconnect, or the like.
公开/授权文献
- US09190347B2 Die edge contacts for semiconductor devices 公开/授权日:2015-11-17
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