发明申请
US20130341433A1 DUAL PLENUM, AXI-SYMMETRIC SHOWERHEAD WITH EDGE-TO-CENTER GAS DELIVERY
有权
双层气体，AXI-SYMMETRIC SHOWERHEAD具有边缘到中心气体输送
- 专利标题： DUAL PLENUM, AXI-SYMMETRIC SHOWERHEAD WITH EDGE-TO-CENTER GAS DELIVERY
- 专利标题（中）： 双层气体，AXI-SYMMETRIC SHOWERHEAD具有边缘到中心气体输送
-
申请号： US13531254申请日： 2012-06-22
-
公开(公告)号： US20130341433A1公开(公告)日： 2013-12-26
- 发明人: Shambhu N. Roy , Vincent E. Burkhart , Natan Solomon , Sanjay Gopinath , Kaihan Abidi Ashtiani , Bart van Schravendijk , Jason Stevens , Dhritiman Subha Kashyap , David Cohen
- 申请人： Shambhu N. Roy , Vincent E. Burkhart , Natan Solomon , Sanjay Gopinath , Kaihan Abidi Ashtiani , Bart van Schravendijk , Jason Stevens , Dhritiman Subha Kashyap , David Cohen
- 主分类号： B05B1/14
- IPC分类号： B05B1/14
摘要：
A dual-plenum showerhead for semiconductor processing operations is provided. The showerhead may include a faceplate with two sets of gas distribution holes, each set fed by a separate plenum. One set of gas distribution holes may be through-holes in a faceplate of the showerhead and may allow gases trapped between the faceplate and a plasma dome to flow towards a wafer. The other set of gas distribution holes may distribute gas routed through passages or channels in the faceplate towards the wafer. The passages or channels in the faceplate may include radial channels and annular channels and may be fed from an annular gas distribution channel about the periphery of the faceplate.
公开/授权文献
信息查询
