Invention Application
- Patent Title: SYSTEMS AND METHODS FOR FABRICATION OF NANOSTRUCTURES
- Patent Title (中): 用于制造纳米结构的系统和方法
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Application No.: US13928143Application Date: 2013-06-26
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Publication No.: US20140001421A1Publication Date: 2014-01-02
- Inventor: Vera N. Lockett , Mark D. Lowenthal , William J. Ray , John Gustafson
- Applicant: NthDegree Technologies Worldwide Inc.
- Applicant Address: US AZ Tempe
- Assignee: NthDegree Technologies Worldwide Inc.
- Current Assignee: NthDegree Technologies Worldwide Inc.
- Current Assignee Address: US AZ Tempe
- Main IPC: H01B1/02
- IPC: H01B1/02 ; H01B13/00

Abstract:
Systems and methods for fabricating nanostructures using other nanostructures as templates. A method includes mixing a dispersion and a reagent solution. The dispersion includes nanostructures such as nanowires including a first element such as copper. The reagent solution includes a second element such as silver. The second element at least partially replaces the first element in the nanostructures. The nanostructures are optionally washed, filtered, and/or deoxidized.
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