Invention Application
- Patent Title: Electrostatic Discharge Protection Element and Electrostatic Discharge Protection Chip and Method of Producing the Same
- Patent Title (中): 静电放电保护元件和静电放电保护芯片及其制造方法
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Application No.: US14020510Application Date: 2013-09-06
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Publication No.: US20140001491A1Publication Date: 2014-01-02
- Inventor: Wolfgang Klein , Hans Taddiken , Winfried Bakalski
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Main IPC: H01L23/60
- IPC: H01L23/60

Abstract:
An electrostatic discharge (ESD) protection element includes a collector area, a first barrier area, a semiconductor area, a second barrier area and an emitter area. The collector area has a first conductivity type. The first barrier area borders on the collector area and has a second conductivity type. The semiconductor area borders on the first barrier area and is an intrinsic semiconductor area, or has the first or second conductivity type and a dopant concentration which is lower than a dopant concentration of the first barrier area. The second barrier area borders on the semiconductor area and has the second conductivity type and a higher dopant concentration than the semiconductor area. The emitter area borders on the second barrier area and has the first conductivity type.
Public/Granted literature
Information query
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