Invention Application
- Patent Title: INNOVATIVE TOP-COAT APPROACH FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE
- Patent Title (中): 用于先进设备的创新顶盖方法片上粒子性能
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Application No.: US13759525Application Date: 2013-02-05
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Publication No.: US20140030533A1Publication Date: 2014-01-30
- Inventor: Jennifer Y. Sun , Biraja P. Kanungo , Dmirty Lubomirsky , Vahid Fioruzdor
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: B05D3/14
- IPC: B05D3/14 ; H01L21/67
Abstract:
To manufacture a coating for an article for a semiconductor processing chamber, the coating is applied to the article by a method including applying a sol-gel coating of Y2O3 over the article, and curing the sol-gel coating on the article by heating the article with the sol-gel coating and exposing the article with the sol-gel coating to plasma in a semiconductor manufacturing chamber.
Public/Granted literature
- US09604249B2 Innovative top-coat approach for advanced device on-wafer particle performance Public/Granted day:2017-03-28
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