发明申请
- 专利标题： POLYSILANESILOXANE RESINS FOR USE IN AN ANTIREFLECTIVE COATING
- 专利标题（中）： 用于抗反射涂层的聚硅氧烷树脂
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申请号： US14003497申请日： 2012-03-08
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公开(公告)号： US20140051804A1公开(公告)日： 2014-02-20
- 发明人: Xiaobing Zhou , Eric S. Moyer
- 申请人： Xiaobing Zhou , Eric S. Moyer
- 国际申请： PCT/US12/28208 WO 20120308
- 主分类号： C09D5/00
- IPC分类号： C09D5/00
摘要：
Polysilanesiloxane copolymers or resins and method of making are provided. The present disclosure further provides a method of applying the polysilanesiloxane copolymers onto a substrate to form a polysilanesiloxane film for use in photolithography (193 nm). The polysilanesiloxane films meet the basic performance criteria expected or desired for use in an antireflection coating (ARC) application,
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