Abstract:
A method of producing silicon containing thin films by the thermal polymerization of a reactive gas mixture bisaminosilacyclobutane and source gas selected from a nitrogen providing gas, an oxygen providing gas and mixtures thereof. The films deposited may be silicon nitride, silicon carbonitride, silicon dioxide or carbon doped silicon dioxide. These films are useful as dielectrics, passivation coatings, barrier coatings, spacers, liners and/or stressors in semiconductor devices.
Abstract:
Inorganic polysilanesiloxane (PSSX) copolymers and method of making and applying the same to the surface of a substrate is provided. These PSSX copolymers are beneficial in forming a dense silicon dioxide layer on a substrate under mild oxidative conditions. The PSSX copolymers comprise SixOy(OH)z units, wherein y and z are defined by the relationship (2y+z)≦(2x+2) and x is either 4 or 5. More specifically, the PSSX copolymers do not contain Si—C covalent bonds.
Abstract:
A method of preparing a polymeric methylene diphenyl diisocyanate-polydialkylsiloxane resin by mixing at a temperature between 25° C. and 100° C.: (i) a polymeric methylene diphenyl diisocyanate with (ii) a polydialkylsiloxane selected from hydroxyalkyl dialkyl terminated polydialkylsiloxane having a viscosity of from 5 to 500 000 cSt at 25° C. or (hydroxyalkoxy)alkyl dialkyl terminated polydialkylsiloxane having a viscosity of from 5 to 500 000 cSt at 25° C. in an amount such that from 1 to 99% by weight of the total weight of (i) and (ii) is component (ii), optionally in the presence of a solvent; and subsequently extracting the solvent, if present.
Abstract:
A method for preparing a bis(alkoxysilylorgano)dicarboxylate includes reacting a haloorganoalkoxysilane, a dimetal salt of a dicarboxyl functional compound, and a phase transfer catalyst. A quaternary iminium compound of a polyaza, polycycloalkene is useful as the phase transfer catalyst. The product may be a bis(alkoxysilylalkyl)fumarate, which is useful as a coupling agent in rubber compositions for tire applications.
Abstract:
A composition comprising at least 93% (w/w) neopentasilane; and a method of preparing neopentasilane, the method comprising treating a tetrakis-(trihalosilyl)silane with diisobutylaluminum hydride.
Abstract:
A polysilane-polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each R1 and each R2 are each independently selected from H, Si, and N atoms, R3 is selected from H, Si, or C atoms, a≧1, b≧1, and a quantity (a+b)≧2. The polysilane-polysilazane copolymer may be formulated in a composition with a solvent. The polysilane-polysilazane copolymer may be used in PMD and STI applications for trench filling, where the trenches have widths of 100 nm or less and aspect ratios of at least (6). The polysilane-polysilazane copolymer can be prepared by amination of a perchloro polysilane having (2) or more silicon atoms per molecule with a primary amine.
Abstract:
A method of preparing a polymeric methylene diphenyl diisocyanate-polydialkylsiloxane resin by mixing at a temperature between 25° C. and 100° C.: (i) a polymeric methylene diphenyl diisocyanate with (ii) a polydialkylsiloxane selected from hydroxyalkyl dialkyl terminated polydialkylsiloxane having a viscosity of from 5 to 500 000 cSt at 25° C. or (hydroxyalkoxy)alkyl dialkyl terminated polydialkylsiloxane having a viscosity of from 5 to 500 000 cSt at 25° C. in an amount such that from 1 to 99% by weight of the total weight of (i) and (ii) is component (ii), optionally in the presence of a solvent; and subsequently extracting the solvent, if present.
Abstract:
A polysilane−polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each R1 and each R2 are each independently selected from H, Si, and N atoms, R3 is selected from H, Si, or C atoms, a≧1, b≧1, and a quantity (a+b)≧2. The polysilane−polysilazane copolymer may be formulated in a composition with a solvent. The polysilane-polysilazane copolymer may be used in PMD and STI applications for trench filling, where the trenches have widths of 100 nm or less and aspect ratios of at least (6). The polysilane−polysilazane copolymer can be prepared by amination of a perchloro polysilane having (2) or more silicon atoms per molecule with a primary amine.
Abstract:
A process for preparing an acryloyloxysilane, the process comprising reacting a metal salt of a carboxylic acid having the formula [CR22═CR1COO−]aMa+ (I), with a haloorganoalkoxysilane having the formula XR3Si(OR4)nR53—n (II) in the presence of mineral spirits and a phase transfer catalyst at a temperature of from 50 to 160° C. to form a mixture comprising an acryloyloxysilane and a metal halide having the formula Ma+X−a (III), wherein R1 is H or C1-C6 hydrocarbyl, each R2 is independently R1 or [COO−]aMa+, Ma+ is an alkali metal cation or alkaline earth metal cation, a is 1 or 2, X is halo, R3 is C1-C6 hydrocarbylene, each R4 is independently C1-C10 Q hydrocarbyl, each R5 is independently R1 and n is an integer from 1 to 3.
Abstract translation:一种制备丙烯酰氧基硅烷的方法,该方法包括使式[CR 22 = CR 1 COO - ] a M a +(I)的羧酸金属盐与式XR 3 Si(OR 4)n R 53-n(II)的卤代有机烷氧基硅烷在 在50至160℃的温度下存在矿物油精和相转移催化剂以形成包含丙烯酰氧基硅烷和具有式Ma + X-a(III)的金属卤化物的混合物,其中R 1为H或C1- C6烃基,每个R2独立地是R1或[COO-] aMa +,Ma +是碱金属阳离子或碱土金属阳离子,a是1或2,X是卤素,R3是C1-C6亚烃基,每个R4独立地是C1- C10Q烃基,每个R5独立地为R1,n为1至3的整数。
Abstract:
Polysilanesiloxane copolymers or resins and method of making are provided. The present disclosure further provides a method of applying the polysilanesiloxane copolymers onto a substrate to form a polysilanesiloxane film for use in photolithography (193 nm). The polysilanesiloxane films meet the basic performance criteria expected or desired for use in an antireflection coating (ARC) application,