Invention Application
- Patent Title: POLYSILANESILOXANE RESINS FOR USE IN AN ANTIREFLECTIVE COATING
- Patent Title (中): 用于抗反射涂层的聚硅氧烷树脂
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Application No.: US14003497Application Date: 2012-03-08
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Publication No.: US20140051804A1Publication Date: 2014-02-20
- Inventor: Xiaobing Zhou , Eric S. Moyer
- Applicant: Xiaobing Zhou , Eric S. Moyer
- International Application: PCT/US12/28208 WO 20120308
- Main IPC: C09D5/00
- IPC: C09D5/00
Abstract:
Polysilanesiloxane copolymers or resins and method of making are provided. The present disclosure further provides a method of applying the polysilanesiloxane copolymers onto a substrate to form a polysilanesiloxane film for use in photolithography (193 nm). The polysilanesiloxane films meet the basic performance criteria expected or desired for use in an antireflection coating (ARC) application,
Information query
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