发明申请
- 专利标题: Bottom and Top Gate Organic Transistors with Fluropolymer Banked Crystallization Well
- 专利标题(中): 底部和顶部有机晶体管与氟聚合物分层结晶井
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申请号: US13768708申请日: 2013-02-15
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公开(公告)号: US20140054560A1公开(公告)日: 2014-02-27
- 发明人: Kanan Puntambekar , Lisa Stecker , Kurt Ulmer
- 申请人: Kanan Puntambekar , Lisa Stecker , Kurt Ulmer
- 主分类号: H01L51/05
- IPC分类号: H01L51/05
摘要:
A method is provided for fabricating a printed organic thin film transistor (OTFT) with a patterned organic semiconductor using a fluropolymer banked crystallization well. In the case of a bottom gate OTFT, a substrate is provided and a gate electrode is formed overlying the substrate. A gate dielectric is formed overlying the gate electrode, and source (S) and drain (D) electrodes are formed overlying the gate dielectric. A gate dielectric OTFT channel interface region is formed between the S/D electrodes. A well with fluropolymer containment and crystallization banks is then formed, to define an organic semiconductor print area. The well is filled with an organic semiconductor, covering the S/D electrodes and the gate dielectric OTFT channel interface. Then, the organic semiconductor is crystallized. Predominant crystal grain nucleation originates from regions overlying the S/D electrodes. As a result, an organic semiconductor channel is formed, interposed between the S/D electrodes.
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