发明申请
US20140064445A1 High speed x-ray inspection microscope 有权
高速x射线检查显微镜

  • 专利标题: High speed x-ray inspection microscope
  • 专利标题(中): 高速x射线检查显微镜
  • 申请号: US13987808
    申请日: 2013-09-04
  • 公开(公告)号: US20140064445A1
    公开(公告)日: 2014-03-06
  • 发明人: David Lewis Adler
  • 申请人: David Lewis Adler
  • 主分类号: G21K7/00
  • IPC分类号: G21K7/00
High speed x-ray inspection microscope
摘要:
The invention discloses an x-ray system that produces highly magnified images of objects such as integrated circuits (ICs), printed circuit boards (PCBs), and other IC packaging technologies.Specifically, the object is illuminated by collimated, high-flux x-rays from an extended source, with the x-ray wavelength selected to provide contrast for the internal structures of the object. The system also comprises a stage to control the position and orientation of the object; a scintillator, positioned in close proximity to the object, that absorbs x-rays and emits visible photons; an optical imaging system that forms a high-resolution magnified image of the photons emitted by the scintillator; and a detector such as a CCD array to convert the image to electronic signals.The x-ray system may also be utilized in methods for high speed metrology or inspection, which in turn enable rapid process development, as well as manufacturing process control and yield management.
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