发明申请
- 专利标题: High speed x-ray inspection microscope
- 专利标题(中): 高速x射线检查显微镜
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申请号: US13987808申请日: 2013-09-04
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公开(公告)号: US20140064445A1公开(公告)日: 2014-03-06
- 发明人: David Lewis Adler
- 申请人: David Lewis Adler
- 主分类号: G21K7/00
- IPC分类号: G21K7/00
摘要:
The invention discloses an x-ray system that produces highly magnified images of objects such as integrated circuits (ICs), printed circuit boards (PCBs), and other IC packaging technologies.Specifically, the object is illuminated by collimated, high-flux x-rays from an extended source, with the x-ray wavelength selected to provide contrast for the internal structures of the object. The system also comprises a stage to control the position and orientation of the object; a scintillator, positioned in close proximity to the object, that absorbs x-rays and emits visible photons; an optical imaging system that forms a high-resolution magnified image of the photons emitted by the scintillator; and a detector such as a CCD array to convert the image to electronic signals.The x-ray system may also be utilized in methods for high speed metrology or inspection, which in turn enable rapid process development, as well as manufacturing process control and yield management.
公开/授权文献
- US09129715B2 High speed x-ray inspection microscope 公开/授权日:2015-09-08
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