发明申请
- 专利标题: EMBEDDED ARCHITECTURE USING RESIN COATED COPPER
- 专利标题(中): 使用树脂涂层的嵌入式结构
-
申请号: US13631959申请日: 2012-09-29
-
公开(公告)号: US20140090879A1公开(公告)日: 2014-04-03
- 发明人: Dilan SENEVIRATNE , Ching-Ping J. SHEN , Liwen JIN , Deepak ARORA , Vinodhkumar RAGHUNATHAN
- 申请人: Dilan SENEVIRATNE , Ching-Ping J. SHEN , Liwen JIN , Deepak ARORA , Vinodhkumar RAGHUNATHAN
- 主分类号: H05K1/11
- IPC分类号: H05K1/11 ; H05K3/00
摘要:
Electronic assemblies and methods for their manufacture are described, including those related to the formation of an assembly including a carrier and a resin coated copper layer positioned on the carrier. The resin coated copper layer includes a first layer comprising a resin and a second layer comprising copper, with the first layer bonded to the second layer. The first layer of the resin coated copper is positioned between the carrier and the second layer of the resin coated copper. An opening is formed in the second layer of the resin coated copper. A die is positioned in the opening. A plurality of dielectric layers and metal pathways are positioned on the second layer and on the die. Other embodiments are described and claimed.
公开/授权文献
- US09451696B2 Embedded architecture using resin coated copper 公开/授权日:2016-09-20
信息查询