Invention Application
US20140103476A1 METHOD FOR MAKING IMAGE SENSORS USING WAFER-LEVEL PROCESSING AND ASSOCIATED DEVICES
有权
使用水平加工和相关设备制作图像传感器的方法
- Patent Title: METHOD FOR MAKING IMAGE SENSORS USING WAFER-LEVEL PROCESSING AND ASSOCIATED DEVICES
- Patent Title (中): 使用水平加工和相关设备制作图像传感器的方法
-
Application No.: US13651526Application Date: 2012-10-15
-
Publication No.: US20140103476A1Publication Date: 2014-04-17
- Inventor: Yonggang JIN , Laurent Herard , WeeChinJudy Lim
- Applicant: STMICROELECTRONICS ASIA PACIFIC PTE. LTD.
- Applicant Address: SG Singapore
- Assignee: STMICROELECTRONICS ASIA PACIFIC PTE. LTD.
- Current Assignee: STMICROELECTRONICS ASIA PACIFIC PTE. LTD.
- Current Assignee Address: SG Singapore
- Main IPC: H01L31/0232
- IPC: H01L31/0232 ; H01L31/0203

Abstract:
A method of making image sensor devices may include forming a sensor layer including image sensor ICs in an encapsulation material, bonding a spacer layer to the sensor layer, the spacer layer having openings therein and aligned with the image sensor ICs, and bonding a lens layer to the spacer layer, the lens layer including lens in an encapsulation material and aligned with the openings and the image sensor ICs. The method may also include dicing the bonded-together sensor, spacer and lens layers to provide the image sensor devices. Helpfully, the method may use WLP to enhance production.
Public/Granted literature
- US09013017B2 Method for making image sensors using wafer-level processing and associated devices Public/Granted day:2015-04-21
Information query
IPC分类: