发明申请
US20140113111A1 High Heat-Radiant Optical Device Substrate and Manufacturing Method Therof
有权
高热辐射光学器件基板和制造方法Therof
- 专利标题: High Heat-Radiant Optical Device Substrate and Manufacturing Method Therof
- 专利标题(中): 高热辐射光学器件基板和制造方法Therof
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申请号: US14129731申请日: 2011-11-23
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公开(公告)号: US20140113111A1公开(公告)日: 2014-04-24
- 发明人: Ki Myung Nam , Tae Hwan Song , Young Chul Jun
- 申请人: Ki Myung Nam , Tae Hwan Song , Young Chul Jun
- 申请人地址: KR Asan-si, Chungcheongnam-do
- 专利权人: Point Engineering Co., LTD
- 当前专利权人: Point Engineering Co., LTD
- 当前专利权人地址: KR Asan-si, Chungcheongnam-do
- 优先权: KR10-2011-0062498 20110627
- 国际申请: PCT/KR2011/008943 WO 20111123
- 主分类号: H01L33/48
- IPC分类号: H01L33/48 ; H01L33/00
摘要:
“The manufacturing of an optical device substrate is achieved by anodizing the surface of a metal plate, coating an insulative liquid bonding agent, having a viscosity which can permeate into an anodized film of the metal plate, on the metal plate, and alternately layering, pressing, and heat treating the metal plate coated with the liquid bonding agent and an insulative film bonding agent before the liquid bonding agent becomes solid so that bonding force between the metal plate and an insulation layer is strengthened, bubbles formation in the liquid bonding agent is inhibited, the fragile nature of the liquid bonding agent after the solidification is reduced producing an optical device substrate with improved mechanical strength and an insulation layer of precisely controlled thickness.”
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