发明申请
- 专利标题: TRANSFER FILM FOR IN-MOLD MOLDING AND METHOD FOR PRODUCING SAME
- 专利标题(中): 用于模内成型的转印膜及其制造方法
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申请号: US14127964申请日: 2012-06-18
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公开(公告)号: US20140113115A1公开(公告)日: 2014-04-24
- 发明人: Kenya Ito , Koji Ohguma , Takuro Tanaka , Yuka Takahashi , Aki Kuromatsu , Mikio Yamahiro
- 申请人: Kenya Ito , Koji Ohguma , Takuro Tanaka , Yuka Takahashi , Aki Kuromatsu , Mikio Yamahiro
- 申请人地址: JP TOKYO
- 专利权人: JNC CORPORATION
- 当前专利权人: JNC CORPORATION
- 当前专利权人地址: JP TOKYO
- 优先权: JP2011-136730 20110620
- 国际申请: PCT/JP2012/065553 WO 20120618
- 主分类号: B29C45/14
- IPC分类号: B29C45/14 ; B32B38/00
摘要:
Provided is a transfer film for in-mold molding which is superior in solvent resistance, heat resistance, durability, blocking resistance, and moldability, and is capable of suppressing the generation of gate flow, and also provided is a method for producing such a film. The film is provided with: a transfer layer (11) which is to be transferred to an in-mold molded body and which is to be cured when irradiated with active energy rays after the transfer; and a film shaped substrate (L0). The transfer layer (11) comprises an IMD layer (L2) laminated on the substrate (L0) and to be arranged on the outermost surface of the molded body after the in-mold molding. The TMD layer (L2) is constituted by a mixture composition containing at least one active-energy curable resin and at least one thermosetting resin.
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