Invention Application
- Patent Title: PHOTORESISTS COMPRISING IONIC COMPOUND
- Patent Title (中): 包含离子化合物的光电
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Application No.: US13665232Application Date: 2012-10-31
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Publication No.: US20140120470A1Publication Date: 2014-05-01
- Inventor: Gerhard POHLERS , Cong LIU , Cheng-Bai XU , Chunyi WU
- Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/20
Abstract:
New photoresist compositions are provided that comprise a component that comprises a radiation-insensitive ionic compound. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a radiation-insensitive ionic compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
Public/Granted literature
- US10527934B2 Photoresists comprising ionic compound Public/Granted day:2020-01-07
Information query
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