Invention Application
- Patent Title: ELECTRON BEAM EXPOSURE APPARATUS AND METHOD
- Patent Title (中): 电子束曝光装置和方法
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Application No.: US14073600Application Date: 2013-11-06
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Publication No.: US20140131589A1Publication Date: 2014-05-15
- Inventor: Akio Yamada
- Applicant: ADVANTEST CORPORATION
- Applicant Address: JP TOKYO
- Assignee: ADVANTEST CORPORATION
- Current Assignee: ADVANTEST CORPORATION
- Current Assignee Address: JP TOKYO
- Priority: JP2012-247696 20121109
- Main IPC: H01J37/317
- IPC: H01J37/317

Abstract:
An electron beam EB0 emitted from an electron gun 101 is cut by a first aperture 103a into a rectangular electron beam DB', which is then cut by second and third apertures 140a, 150a into an electron beam EB3 so that the edge cut by the first aperture 103a is removed from the electron beam EB1. This can prevent blur due to the influence of coulomb interaction of the electron beam EB1 between the first and second apertures 103a to 140a and perform highly accurate exposure with the electron beam EB3 having high current density.
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