Invention Application
US20140131589A1 ELECTRON BEAM EXPOSURE APPARATUS AND METHOD 审中-公开
电子束曝光装置和方法

ELECTRON BEAM EXPOSURE APPARATUS AND METHOD
Abstract:
An electron beam EB0 emitted from an electron gun 101 is cut by a first aperture 103a into a rectangular electron beam DB', which is then cut by second and third apertures 140a, 150a into an electron beam EB3 so that the edge cut by the first aperture 103a is removed from the electron beam EB1. This can prevent blur due to the influence of coulomb interaction of the electron beam EB1 between the first and second apertures 103a to 140a and perform highly accurate exposure with the electron beam EB3 having high current density.
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