Invention Application
US20140151094A1 ACTIVE ESTER RESIN, METHOD FOR PRODUCING THE SAME, THERMOSETTING RESIN COMPOSITION, CURED PRODUCT OF THE THERMOSETTING RESIN COMPOSITION, SEMICONDUCTOR ENCAPSULATING MATERIAL, PRE-PREG, CIRCUIT BOARD, AND BUILD-UP FILM 有权
活性酯树脂,其生产方法,热固性树脂组合物,固化树脂组合物固化产物,半导体封装材料,PRE-PREG,电路板和建筑薄膜

  • Patent Title: ACTIVE ESTER RESIN, METHOD FOR PRODUCING THE SAME, THERMOSETTING RESIN COMPOSITION, CURED PRODUCT OF THE THERMOSETTING RESIN COMPOSITION, SEMICONDUCTOR ENCAPSULATING MATERIAL, PRE-PREG, CIRCUIT BOARD, AND BUILD-UP FILM
  • Patent Title (中): 活性酯树脂,其生产方法,热固性树脂组合物,固化树脂组合物固化产物,半导体封装材料,PRE-PREG,电路板和建筑薄膜
  • Application No.: US13824821
    Application Date: 2012-05-25
  • Publication No.: US20140151094A1
    Publication Date: 2014-06-05
  • Inventor: Kan TakeuchiEtsuko SuzukiKunihiro MorinagaKazuo Arita
  • Applicant: Kan TakeuchiEtsuko SuzukiKunihiro MorinagaKazuo Arita
  • Applicant Address: JP Tokyo
  • Assignee: DIC Corporation
  • Current Assignee: DIC Corporation
  • Current Assignee Address: JP Tokyo
  • Priority: JP2011-119080 20110527
  • International Application: PCT/JP2012/063443 WO 20120525
  • Main IPC: H05K1/03
  • IPC: H05K1/03 C09D167/00 H05K3/00 C08G63/60
ACTIVE ESTER RESIN, METHOD FOR PRODUCING THE SAME, THERMOSETTING RESIN COMPOSITION, CURED PRODUCT OF THE THERMOSETTING RESIN COMPOSITION, SEMICONDUCTOR ENCAPSULATING MATERIAL, PRE-PREG, CIRCUIT BOARD, AND BUILD-UP FILM
Abstract:
A low dielectric constant, a low dielectric loss tangent, and heat resistance are achieved. An active ester resin that has a resin structure produced by reacting a polyfunctional phenolic compound (a1) with a monofunctional aromatic carboxylic acid or its chloride (a2) and an aromatic dicarboxylic acid or its chloride (a3). The polyfunctional phenolic compound (a1) is represented by structural formula (1) below: (where Ar represents a benzene ring, a naphthalene ring, a benzene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, or a naphthalene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, X represents a methylene group, a divalent cyclic aliphatic hydrocarbon group, a phenylene dimethylene group, or a biphenylene-dimethylene group, and n represents the number of repeating units and the average thereof is in a range of 0.5 to 10).
Information query
Patent Agency Ranking
0/0