发明申请
US20140151571A1 CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
审中-公开
充电颗粒光束和曝光装置使用它
- 专利标题： CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- 专利标题（中）： 充电颗粒光束和曝光装置使用它
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申请号： US14005175申请日： 2012-03-14
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公开(公告)号： US20140151571A1公开(公告)日： 2014-06-05
- 发明人: Takahisa Kato , Yutaka Setomoto
- 申请人： Takahisa Kato , Yutaka Setomoto
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-056812 20110315
- 国际申请： PCT/JP2012/001777 WO 20120314
- 主分类号： H01J37/12
- IPC分类号： H01J37/12
摘要：
In a charged particle beam lens according to the present invention, the orientations of through-holes formed in electrodes and precision of forming the through-holes are determined in accordance with the degree of influences of the surfaces of the electrodes on the aberration of the lens.
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