发明申请
US20140152991A1 Level Sensor of Exposure Apparatus and Wafer-Leveling Methods Using the Same
审中-公开
曝光装置的水平传感器和使用其的晶片调平方法
- 专利标题： Level Sensor of Exposure Apparatus and Wafer-Leveling Methods Using the Same
- 专利标题（中）： 曝光装置的水平传感器和使用其的晶片调平方法
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申请号： US13901652申请日： 2013-05-24
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公开(公告)号： US20140152991A1公开(公告)日： 2014-06-05
- 发明人: Jinseok Heo , Jeongho Yeo
- 申请人： Samsung Electronics Co., Ltd.
- 申请人地址： KR Gyeonggi-do
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Gyeonggi-do
- 优先权： KR1020120080626 20120724
- 主分类号： G01N21/95
- IPC分类号： G01N21/95 ; G01N21/55
摘要：
A level sensor of an exposure apparatus includes a light source that generates light that is illuminated onto a top surface of a wafer, a projection part provided in a path of incident light propagating from the light source to the wafer and having a single first slit, a detection part provided in a path of light reflected from the wafer and having a single second slit, and a detector that detects the reflected light that is incident on the second slit of the detection part.
信息查询
