发明申请
US20140170535A1 PELLICLE, PRESSURE-SENSITIVE ADHESIVE FOR PELLICLE, PHOTOMASK WITH PELLICLE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
有权
薄膜，压敏粘合剂用于薄膜，带有薄膜的光电胶片和制造半导体器件的方法
- 专利标题： PELLICLE, PRESSURE-SENSITIVE ADHESIVE FOR PELLICLE, PHOTOMASK WITH PELLICLE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- 专利标题（中）： 薄膜，压敏粘合剂用于薄膜，带有薄膜的光电胶片和制造半导体器件的方法
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申请号： US14118106申请日： 2012-05-18
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公开(公告)号： US20140170535A1公开(公告)日： 2014-06-19
- 发明人: Kohei Yano , Daiki Yamashita
- 申请人： Kohei Yano , Daiki Yamashita
- 申请人地址： JP Tokyo
- 专利权人： ASAHI KASEI E-MATERIALS CORPORATION
- 当前专利权人： ASAHI KASEI E-MATERIALS CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-111832 20110518; JP2011-178416 20110817
- 国际申请： PCT/JP2012/062831 WO 20120518
- 主分类号： G03F1/64
- IPC分类号： G03F1/64 ; C09J133/08
摘要：
To provide a pellicle having a an adhesive, wherein adhesive residue is decreased at the time of peeling the pellicle from a mask after lithographic exposure and outgassing from the adhesive is suppressed The pellicle according to the present invention is a pellicle comprising a pellicle frame, a tensioned pellicle film placed on one end surface of the pellicle frame and an adhesive applied to the other end surface thereof, in which the adhesive contains a (meth)acrylic alkyl ester copolymer and a silane compound, and the (meth)acrylic alkyl ester copolymer is a copolymer of a (meth)acrylic alkyl ester having an alkyl group of 4 to 14 carbon atoms and a monomer having a functional group reactive to at least either one of an isocyanate group or an epoxy group.
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