Invention Application
US20140178806A1 NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, AND PHOTOMASK
有权
阴离子敏感性或辐射敏感性树脂组合物，使用其的耐腐蚀膜，耐蚀涂层掩模，抗蚀图案形成方法和光电子
- Patent Title: NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, AND PHOTOMASK
- Patent Title (中): 阴离子敏感性或辐射敏感性树脂组合物，使用其的耐腐蚀膜，耐蚀涂层掩模，抗蚀图案形成方法和光电子
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Application No.: US14193183Application Date: 2014-02-28
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Publication No.: US20140178806A1Publication Date: 2014-06-26
- Inventor: Tomotaka TSUCHIMURA , Takeshi INASAKI
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2011-191955 20110902
- Main IPC: G03F7/038
- IPC: G03F7/038
Abstract:
As a negative actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern excellent in sensitivity, resolution and pattern profile and reduced in line edge roughness (LER), scum and development defect, a negative actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a polymer compound containing (a) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation and (b) a repeating unit having a phenolic hydroxyl group, and (B) a crosslinking agent, is provided.
Public/Granted literature
Information query
IPC分类:
