公开(公告)号：US20150118623A1

公开(公告)日：2015-04-30

申请号：US14586129

申请日：2014-12-30

Applicant: FUJIFILM Corporation

Inventor： Takuya TSURUTA ,  Tomotaka TSUCHIMURA ,  Kaoru IWATO

IPC: C08F12/24 ,  G03F7/20 ,  G03F7/004

CPC classification number: C08F12/24 ,  C08F8/02 ,  C08F12/32 ,  C08F212/14 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/20 ,  C08F212/32 ,  C08F212/08 ,  C08F220/32 ,  C08F220/36

Abstract: A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 and R3 represent a hydrogen atom, an alkyl group, or a cycloalkyl group; L represents a divalent linking group or a single bond; Y represents a substituent excluding a methylol group; Z represents a hydrogen atom or a substituent; m represents an integer of 0 to 4; n represents an integer of 1 to 5; and m+n is 5 or less.

Abstract translation: 本发明的树脂组合物含有含有下述通式（1）表示的重复单元（Q）的高分子化合物（A）：其中，R1表示氢原子，甲基或卤原子; R2和R3表示氢原子，烷基或环烷基; L表示二价连接基团或单键; Y表示除羟甲基之外的取代基; Z表示氢原子或取代基; m表示0〜4的整数， n表示1〜5的整数， m + n为5以下。

公开(公告)号：US20140030643A1

公开(公告)日：2014-01-30

申请号：US14039435

申请日：2013-09-27

Applicant: FUJIFILM Corporation

Inventor： Toshiya TAKAHASHI ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI ,  Shuji HIRANO ,  Tomotaka TSUCHIMURA

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.

Abstract translation: 本发明提供了包含含有酸分解性重复单元（A）的树脂（P）的光化学射线或辐射敏感性树脂组合物，该树脂在被酸作用时增加其在碱性显影剂中的溶解度，化合物 Q）当暴露于光化射线或辐射时，产生酸和由以下通式（1）或（2）表示的化合物（R）。

公开(公告)号：US20200183280A1

公开(公告)日：2020-06-11

申请号：US16794442

申请日：2020-02-19

Applicant: FUJIFILM Corporation

Inventor： Michihiro OGAWA ,  Akihiro KANEKO ,  Takashi KAWASHIMA ,  Tomotaka TSUCHIMURA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08L33/06 ,  C08L33/16

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition is an actinic ray-sensitive or radiation-sensitive resin composition including a compound that generates an acid upon irradiation with actinic rays or radiation and a resin capable of increasing polarity by the action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1) and at least one halogen atom selected from the group consisting of a fluorine atom and an iodine atom.

公开(公告)号：US20170121437A1

公开(公告)日：2017-05-04

申请号：US15405527

申请日：2017-01-13

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA

IPC: C08F212/14 ,  C08F220/68 ,  C08F220/18 ,  G03F7/004 ,  G03F7/038 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  G03F7/039 ,  G03F7/20 ,  G03F7/16

Abstract: A pattern forming method includes forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, exposing the film with active light or radiation, and developing the exposed film using a developer including an organic solvent, in which the actinic ray-sensitive or radiation-sensitive resin composition contains a compound having a partial structure represented by General Formula (I).

公开(公告)号：US20170005266A1

公开(公告)日：2017-01-05

申请号：US15259164

申请日：2016-09-08

Applicant: FUJIFILM Corporation

Inventor： Yuzo NAGATA ,  Hiroo TAKIZAWA ,  Tomotaka TSUCHIMURA ,  Takuya TSURUTA

IPC: H01L51/00 ,  C08F20/28 ,  C08F12/22 ,  H01L51/05 ,  C08F12/24

CPC classification number: H01L51/004 ,  C08F12/22 ,  C08F12/24 ,  C08F20/28 ,  C08F212/14 ,  C08F2500/02 ,  C08F2800/10 ,  C08F2810/20 ,  H01L21/02118 ,  H01L29/786 ,  H01L51/0043 ,  H01L51/0055 ,  H01L51/0071 ,  H01L51/0094 ,  H01L51/052 ,  H01L51/0545 ,  H01L51/0566 ,  C08F2220/325 ,  C08F212/32 ,  C08F220/36 ,  C08F2220/302 ,  C08F2220/343

Abstract: Provided is a semiconductor element having a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound having a repeating unit (IA) represented by the following General Formula (IA) and a repeating unit (IB) represented by the following General Formula (IB). In General Formula (IA), R1a represents a hydrogen atom, a halogen atom, or an alkyl group. L1a and L2a each independently represent a single bond or a linking group. X represents a crosslinkable group. m2a represents an integer of 1 to 5, and in a case where m2a is 2 or more, m2a number of X's may be the same or different from each other, m1a represents an integer of 1 to 5, and in a case where m1a is 2 or more, m1a number of (-L2a-(X)m2a)'s may be the same or different from each other. In General Formula (IB), R1b represents a hydrogen atom, a halogen atom, or an alkyl group. L1b represents a single bond or a linking group, and Ar1b represents an aromatic ring, m1b represents an integer of 1 to 5.

Abstract translation: 在通式（IA）中，R 1a表示氢原子，卤素原子或烷基。 L1a和L2a各自独立地表示单键或连接基团。 X表示可交联基团。 m2a表示1〜5的整数，并且在m2a为2以上的情况下，m 1a的数X可以相同或不同，m1a表示1〜5的整数，在m1a为 2个以上时，m1a个（-L2a-（X）m2a）可以相同也可以不同。 在通式（IB）中，R 1b表示氢原子，卤素原子或烷基。 L1b表示单键或连接基，Ar1b表示芳香环，m1b表示1〜5的整数。

公开(公告)号：US20160147155A1

公开(公告)日：2016-05-26

申请号：US15011863

申请日：2016-02-01

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Takuya TSURUTA ,  Tomotaka TSUCHIMURA

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/325 ,  C08F12/22 ,  C08F12/32 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2004 ,  G03F7/2059

Abstract: There are provided A pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific 3 repeating units.

Abstract translation: 提供了一种图案形成方法，包括：（1）使用活性光敏或辐射敏感树脂组合物形成膜; （2）将膜暴露于活性光或辐射; 和（3）使用包含有机溶剂的显影剂显影所述曝光膜，其中所述活性光敏或辐射敏感性树脂组合物含有具有特定3个重复单元的树脂（A）。

公开(公告)号：US20160116840A1

公开(公告)日：2016-04-28

申请号：US14982759

申请日：2015-12-29

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA

IPC: G03F7/004 ,  H01L21/027 ,  C07C327/24 ,  C07C321/28 ,  C07D333/76 ,  C07C309/19 ,  C07C323/20 ,  C07C25/18 ,  C07C323/09 ,  C07D333/46 ,  C07D209/48 ,  C07C311/16 ,  C07D327/08 ,  C07J41/00 ,  G03F7/038 ,  G03F1/76 ,  H01L29/16

CPC classification number: G03F7/0045 ,  C07C25/18 ,  C07C309/15 ,  C07C309/19 ,  C07C311/14 ,  C07C311/16 ,  C07C311/48 ,  C07C311/51 ,  C07C321/28 ,  C07C323/09 ,  C07C323/20 ,  C07C327/22 ,  C07C327/24 ,  C07C327/26 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/18 ,  C07C2603/24 ,  C07C2603/74 ,  C07D209/48 ,  C07D327/08 ,  C07D333/46 ,  C07D333/76 ,  C07D335/16 ,  C07D339/08 ,  C07D347/00 ,  C07D493/08 ,  C07J31/006 ,  C07J41/0055 ,  C07J41/0061 ,  G03F1/76 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  H01L21/0271 ,  H01L21/0276 ,  H01L29/16

Abstract: Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Y1 and Y2 represents a monovalent organic group; each of M1+ and M2+ represents an organic onium ion; each of X1 and X2 represents a group that is represented by —S—, —NH—, or —NR1—; R1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R1 and Y1 or Y2 may bond with each other to form a ring.

Abstract translation: 本发明提供含有由通式（I）或（II）表示的化合物（A））的有源光敏性或辐射敏感性树脂组合物：在该式中，Y1和Y2各自表示一价有机基团; M1 +和M2 +各自表示有机鎓离子; X1和X2各自表示由-S-，-NH-或-NR1-表示的基团; R1表示一价有机基团; n1和n2各自表示1以上的整数， 并且R1和Y1或Y2可以彼此键合形成环。

公开(公告)号：US20130084518A1

公开(公告)日：2013-04-04

申请号：US13633681

申请日：2012-10-02

Applicant: FUJIFILM CORPORATION

Inventor： Tomotaka TSUCHIMURA ,  Takeshi INASAKI

IPC: G03F7/004 ,  G03F1/00 ,  G03F1/76 ,  G03F1/78 ,  G03F1/50 ,  G03F7/20

CPC classification number: G03F7/0382 ,  G03F1/56 ,  G03F1/76

Abstract: Disclosed is a negative chemical amplification resist composition including (A) a polymer compound having a repeating unit (P) represented by the following formula (I) which is stable in acids and alkalis, and a repeating unit (Q) having a phenolic hydroxyl group; (B) a compound capable of generating an acid when irradiated with actinic rays or a radiation; and (C) a cross-linking agent: in which, in the formula (I), R1 represents a hydrogen atom or a methyl group; L1 represents an oxygen atom or —NH—; L2 represents a single bond or an alkylene group; and A represents a polycyclic hydrocarbon group.

Abstract translation: 公开了一种负极化学增幅抗蚀剂组合物，其包含（A）具有在酸和碱中稳定的由下式（I）表示的重复单元（P）的高分子化合物和具有酚羟基的重复单元（Q） ; （B）当用光化射线或辐射照射时能够产生酸的化合物; 和（C）交联剂：其中，在式（I）中，R 1表示氢原子或甲基; L1表示氧原子或-NH-; L2表示单键或亚烷基; A表示多环烃基。

公开(公告)号：US20200050106A1

公开(公告)日：2020-02-13

申请号：US16655447

申请日：2019-10-17

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Mitsuhiro FUJITA ,  Tomotaka TSUCHIMURA ,  Takashi KAWASHIMA ,  Michihiro OGAWA ,  Akihiro KANEKO ,  Hironori OKA ,  Yasuharu SHIRAISHI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)  Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.

公开(公告)号：US20160327862A1

公开(公告)日：2016-11-10

申请号：US15212552

申请日：2016-07-18

Applicant: FUJIFILM Corporation

Inventor： Tomotaka TSUCHIMURA ,  Shuhei YAMAGUCHI ,  Natsumi YOKOKAWA

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F1/50

CPC classification number: G03F7/038 ,  C08F12/22 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08K5/13 ,  C09D125/18 ,  G03F1/50 ,  G03F7/004 ,  G03F7/0382 ,  G03F7/2059 ,  G03F7/322

Abstract: An actinic ray sensitive or radiation sensitive resin composition contains a polymer compound (A) having a phenolic hydroxyl group and satisfying the following (a) and (b), a compound (B) capable of generating an acid upon irradiation with actinic rays or radiation, and a crosslinking agent (C) for crosslinking the polymer compound (A) by the action of an acid and having a glass transition temperature (Tg) of 200° C. or higher: (a) the weight-average molecular weight is 3,000 or more and 6,500 or less, and (b) the glass transition temperature (Tg) is 140° C. or higher.

Abstract translation: 该活性光敏感性或辐射敏感性树脂组合物含有以下物质：含有酚羟基的高分子化合物（A），（a）重均分子量在3000〜6500以下，（b） 玻璃化转变温度（Tg）至少为140℃; 暴露于活性光或辐射时产生酸的化合物（B）; 和（C）通过上述酸的作用使高分子化合物（A）交联并且玻璃化转变温度（Tg）为至少200℃的交联剂。