Invention Application
- Patent Title: PEELING LIQUID FOR A RESIST
- Patent Title (中): 沾染液体
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Application No.: US14093737Application Date: 2013-12-02
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Publication No.: US20140179583A1Publication Date: 2014-06-26
- Inventor: Shi SHU , Lu LIU , Can Wang , Yonglian QI , Guanbao HUI
- Applicant: Boe Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: Boe Technology Group Co., Ltd.
- Current Assignee: Boe Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Priority: CN201210523929.3 20121207
- Main IPC: G03F7/42
- IPC: G03F7/42

Abstract:
The invention discloses a peeling liquid for a resist, which relates to an optical element and is used for removing the color resist and the protective layer on a color filter rapidly and efficiently. The peeling liquid for a color resist on a color filter comprises an alkali metal alkoxide with a mass percentage of 10-45%, an organic amine with a mass percentage of 10-30%, a surfactant with a mass percentage of 5-30%, a solvent with a mass percentage of 20-60%, and an alcohol with a mass percentage of 1-55% in terms of the peeling liquid for a resist with a mass percentage of 100%. The peeling liquid for a resist in invention is used for removing the color resist and the protective layer of the substandard product in a color filter.
Public/Granted literature
- US09229329B2 Peeling liquid for a resist Public/Granted day:2016-01-05
Information query
IPC分类: