Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Patent Title (中): 平面设备，设置平面设备的方法和设备制造方法
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Application No.: US14236299Application Date: 2012-07-24
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Publication No.: US20140192337A1Publication Date: 2014-07-10
- Inventor: Arno Jan Bleeker , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Danny Maria Hubertus Philips , Ruud Antonius Catharina Maria Beerens
- Applicant: Arno Jan Bleeker , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Danny Maria Hubertus Philips , Ruud Antonius Catharina Maria Beerens
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2012/064452 WO 20120724
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.
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