公开(公告)号：US09383654B2

公开(公告)日：2016-07-05

申请号：US12506565

申请日：2009-07-21

Applicant: Daniel Jozef Maria Direcks ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

Inventor： Daniel Jozef Maria Direcks ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Danny Maria Hubertus Philips ,  Michel Riepen ,  Clemens Johannes Gerardus Van Den Dungen ,  Adrianes Johannes Baeten ,  Fabrizio Evangelista

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70991

Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Abstract translation: 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。

公开(公告)号：US09036127B2

公开(公告)日：2015-05-19

申请号：US12423528

申请日：2009-04-14

Applicant: Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

Inventor： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Abstract translation: 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US20140192337A1

公开(公告)日：2014-07-10

申请号：US14236299

申请日：2012-07-24

Applicant: Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Danny Maria Hubertus Philips ,  Ruud Antonius Catharina Maria Beerens

Inventor： Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Danny Maria Hubertus Philips ,  Ruud Antonius Catharina Maria Beerens

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/7005 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70825

Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.

Abstract translation: 一种具有可编程图案形成装置和投影系统的光刻设备。 可编程图案形成装置被配置为提供多个辐射束。 投影系统具有配置成将多个辐射束投影到基板上的透镜组阵列。 投影系统还包括对应于透镜组阵列的透镜组的光路中的焦点调节器。 焦点调节器具有基本上为零光功率的光学元件。

公开(公告)号：US08638417B2

公开(公告)日：2014-01-28

申请号：US13085069

申请日：2011-04-12

Applicant: Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

Inventor： Danny Maria Hubertus Philips ,  Daniel Jozef Maria Direcks ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC: G03B27/52 ,  G03B27/42

CPC classification number: G03F7/70341 ,  Y10T137/86292

Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

Abstract translation: 公开了一种流体处理结构，其被配置为将浸没液体供应到在投影系统和面向流体处理结构的相对表面之间限定的空间中。 流体处理结构的下表面具有供给开口，其构造成朝向相对表面供应流体;多个提取开口，其构造成从流体处理结构和相对表面之间移除流体;以及在供给开口和提取物之间的突起 开口

公开(公告)号：US20120229782A1

公开(公告)日：2012-09-13

申请号：US13408471

申请日：2012-02-29

Applicant: Han-Kwang Nienhuys ,  Martinus Anges Willem Cuijpers ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Olesksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

Inventor： Han-Kwang Nienhuys ,  Martinus Anges Willem Cuijpers ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Olesksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

IPC: G03B27/52

CPC classification number: G03F7/70933 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

公开(公告)号：US20100103391A1

公开(公告)日：2010-04-29

申请号：US12582919

申请日：2009-10-21

Applicant: Clemens Johannes Gerardus VAN DEN DUNGEN ,  Danny Maria Hubertus PHILIPS ,  Koen STEFFENS ,  Tijmen Wilfred Mathijs GUNTHER ,  David BESSEMS

Inventor： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Danny Maria Hubertus PHILIPS ,  Koen STEFFENS ,  Tijmen Wilfred Mathijs GUNTHER ,  David BESSEMS

IPC: G03B27/52 ,  G03B27/32

CPC classification number: G03F7/70341

Abstract: A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.

Abstract translation: 公开了一种流体处理结构和光刻设备，其中采取措施，特别是针对流体处理结构的底表面中的开口阵列的尺寸和间距来处理和/或防止在浸没液体中形成气泡 。

公开(公告)号：US20100060868A1

公开(公告)日：2010-03-11

申请号：US12550481

申请日：2009-08-31

Applicant: Gheorghe Tanasa ,  Nicolaas Ten Kate ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Danny Maria Hubertus Philips ,  Maikel Adrianus Cornelis Schepers ,  Laurentius Johannes Adrianus Van Bokhoven

Inventor： Gheorghe Tanasa ,  Nicolaas Ten Kate ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Danny Maria Hubertus Philips ,  Maikel Adrianus Cornelis Schepers ,  Laurentius Johannes Adrianus Van Bokhoven

IPC: G03B27/42 ,  F17D1/00 ,  G03B27/52

CPC classification number: G03F7/70341 ,  Y10T137/87169

Abstract: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.

Abstract translation: 公开了一种流体处理结构，其被设计用于所有湿式浸渍光刻。 流体处理结构具有第一开口以将流体提供到投影系统的最终元件与基板和/或基板台之间的空间，阻挡液体流出流体处理结构和流体处理结构之间的空间的屏障 基板和第二开口，该第二开口通向该空间的径向外侧的区域，以将流体从流体处理结构提供到该空间的径向向外的基板和/或基板台的顶表面上。 可以设置控制器，使得朝向衬底台的中心的流体流大于离开衬底台的中心的方向的流体流动。

公开(公告)号：US08730448B2

公开(公告)日：2014-05-20

申请号：US13409752

申请日：2012-03-01

Applicant: Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Nicolaas Ten Kate ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Laurentius Johannes Adrianus Van Bokhoven ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

Inventor： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Nicolaas Ten Kate ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Laurentius Johannes Adrianus Van Bokhoven ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。

公开(公告)号：US20120229783A1

公开(公告)日：2012-09-13

申请号：US13409752

申请日：2012-03-01

Applicant: Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Nicolaas Ten Kate ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Laurentius Johannes Adrianus Van Bokhoven ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

Inventor： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Nicolaas Ten Kate ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Laurentius Johannes Adrianus Van Bokhoven ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

IPC: G03B27/52

CPC classification number: G03F7/70933 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。

公开(公告)号：US20110013158A1

公开(公告)日：2011-01-20

申请号：US12795091

申请日：2010-06-07

Applicant: Danny Maria Hubertus PHILIPS ,  Daniel Jozef Maria Direcks ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens

Inventor： Danny Maria Hubertus PHILIPS ,  Daniel Jozef Maria Direcks ,  Maikel Adrianus Cornelis Schepers ,  Paul Petrus Joannes Berkvens

IPC: G03B27/52 ,  F03B11/00

CPC classification number: G03F7/70341 ,  Y10T137/8593

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.

Abstract translation: 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 在使用中，流体处理结构的下表面的第一部分与面向下表面的第二部分的距离与面对表面不同。 此外，第一部分在其中限定了供给开口，其构造成朝向相对表面供应液体;以及提取开口，构造成从流体处理结构和面对表面之间移除流体。