Invention Application
- Patent Title: FINNED SHUTTER DISK FOR A SUBSTRATE PROCESS CHAMBER
- Patent Title (中): 用于基板工艺室的精加工快门盘
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Application No.: US13742692Application Date: 2013-01-16
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Publication No.: US20140196848A1Publication Date: 2014-07-17
- Inventor: BONNIE T. CHIA , SONG-MOON SUH , CHENG-HSIUNG MATTHEW TSAI , ROBERT DINSMORE , GLEN T. MORI
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Main IPC: B05C21/00
- IPC: B05C21/00

Abstract:
Shutter disks for use in process chambers are provided herein. In some embodiments, a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter, and a bottom surface of the body.
Public/Granted literature
- US09147558B2 Finned shutter disk for a substrate process chamber Public/Granted day:2015-09-29
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