发明申请
US20140205840A1 METHOD FOR PRODUCING NITRIDE SINGLE CRYSTAL AND AUTOCLAVE FOR USE IN THE METHOD
审中-公开
用于生产氮化物单晶和自动化的方法用于该方法
- 专利标题: METHOD FOR PRODUCING NITRIDE SINGLE CRYSTAL AND AUTOCLAVE FOR USE IN THE METHOD
- 专利标题(中): 用于生产氮化物单晶和自动化的方法用于该方法
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申请号: US14128474申请日: 2011-06-23
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公开(公告)号: US20140205840A1公开(公告)日: 2014-07-24
- 发明人: Kensuke Aoki , Kazuo Yoshida , Katsuhito Nakamura , Tsuguo Fukuda
- 申请人: Kensuke Aoki , Kazuo Yoshida , Katsuhito Nakamura , Tsuguo Fukuda
- 申请人地址: JP Sendai-shi, Miyagi JP Osaka-shi, Osaka
- 专利权人: TOHOKU UNIVERSITY,ASAHI KASEI KABUSHIKI KAISHA
- 当前专利权人: TOHOKU UNIVERSITY,ASAHI KASEI KABUSHIKI KAISHA
- 当前专利权人地址: JP Sendai-shi, Miyagi JP Osaka-shi, Osaka
- 国际申请: PCT/JP2011/064469 WO 20110623
- 主分类号: C30B7/10
- IPC分类号: C30B7/10 ; C01B21/06 ; C30B29/40
摘要:
There is provided a novel method for producing a nitride single crystal with both a rapid crystal growth rate and high crystal quality, as well as a novel autoclave that can be used in the method. The invention provides a method for producing a Ga-containing nitride single crystal by an ammonothermal method, comprising introducing at least a starting material, an acidic mineralizer and ammonia into an autoclave, and then growing a Ga-containing nitride single crystal under conditions wherein the temperature (T1) at the single crystal growth site is 600° C. to 850° C., the temperature (T1) at the single crystal growth site and the temperature (T2) at the starting material feeder site are in the relationship T1>T2, and the pressure in the autoclave is 40 MPa to 250 MPa, as well as an autoclave that can be used in the method.
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