发明申请
- 专利标题： INSULATING FILM
- 专利标题（中）： 绝缘膜
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申请号： US14239952申请日： 2012-06-29
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公开(公告)号： US20140234617A1公开(公告)日： 2014-08-21
- 发明人: Shunsuke Masaki , Toshimasa Nishimori , Hiroyuki Fujita , Kazunori Hayashi , Jun Fujiki
- 申请人： Shunsuke Masaki , Toshimasa Nishimori , Hiroyuki Fujita , Kazunori Hayashi , Jun Fujiki
- 申请人地址： JP Ibaraki-shi, Osaka
- 专利权人： NITTO DENKO CORPORATION
- 当前专利权人： NITTO DENKO CORPORATION
- 当前专利权人地址： JP Ibaraki-shi, Osaka
- 优先权： JP2011-183462 20110825; JP2012-120619 20120528
- 国际申请： PCT/JP2012/066735 WO 20120629
- 主分类号： H01B3/30
- IPC分类号： H01B3/30
摘要：
Provided is an insulating film which is excellent in heat resistance and discharge deterioration resistance and has a long insulation life. The insulating film includes a heat-resistant resin and insulating fine particles dispersed in the heat-resistant resin. The inscribed circles of regions, which are free of the insulating fine particles, have an average diameter of 80 to 900 nm.
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