发明申请
- 专利标题: MULTIPLE QUANTUM WELL STRUCTURE
- 专利标题(中): 多量子井结构
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申请号: US13851953申请日: 2013-03-27
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公开(公告)号: US20140291613A1公开(公告)日: 2014-10-02
- 发明人: Ching-Liang Lin , Shen-Jie Wang , Yen-Lin Lai
- 申请人: Ching-Liang Lin , Shen-Jie Wang , Yen-Lin Lai
- 申请人地址: TW Tainan
- 专利权人: Genesis Photonics Inc.
- 当前专利权人: Genesis Photonics Inc.
- 当前专利权人地址: TW Tainan
- 主分类号: H01L29/15
- IPC分类号: H01L29/15 ; H01L29/205 ; H01L29/06
摘要:
A multiple quantum well structure including a plurality of well-barrier pairs arranged along a direction is provided. Each of the well-barrier pairs includes a barrier layer and a well layer adjacent to the barrier layer. The barrier layers and the well layers of the well-barrier pairs are disposed alternately. A ratio of a thickness of the well layer in the direction to a thickness of the barrier layer in the direction in each well-barrier pair is a well-barrier thickness ratio, and the well-barrier thickness ratios of a part of the well-barrier pairs gradually increase along the direction.
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