发明申请
US20140294720A1 LiCoO2 FILM-FORMING PRECURSOR SOLUTION AND METHOD OF FORMING LiCoO2 FILM USING THE SAME
审中-公开
LiCoO2成膜前体溶液及其形成LiCoO2膜的方法
- 专利标题： LiCoO2 FILM-FORMING PRECURSOR SOLUTION AND METHOD OF FORMING LiCoO2 FILM USING THE SAME
- 专利标题（中）： LiCoO2成膜前体溶液及其形成LiCoO2膜的方法
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申请号： US14185171申请日： 2014-02-20
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公开(公告)号： US20140294720A1公开(公告)日： 2014-10-02
- 发明人: Takashi Noguchi , Toshiaki Watanabe , Hideaki Sakurai , Nobuyuki Soyama
- 申请人： MITSUBISHI MATERIALS CORPORATION
- 申请人地址： JP Tokyo
- 专利权人： MITSUBISHI MATERIALS CORPORATION
- 当前专利权人： MITSUBISHI MATERIALS CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2013-065839 20130327
- 主分类号： C01D15/02
- IPC分类号： C01D15/02 ; H01M10/0525 ; H01M10/058
摘要：
A LiCoO2 film-forming precursor solution is a precursor solution used to form a LiCoO2 film which is used as a positive electrode material of a thin film lithium secondary battery. In this LiCoO2 film-forming precursor solution, an organic lithium compound and an organic cobalt compound are dissolved in an organic solvent. In addition, the organic lithium compound is a lithium salt of a carboxylic acid represented by a formula CnH2n+1COOH (wherein, 2≦n≦8).