Invention Application
US20140308445A1 CANISTER FOR DEPOSITION APPARATUS, AND DEPOSITION APPARATUS AND METHOD USING THE SAME
审中-公开
沉积装置用吸水装置及沉积装置及其使用方法
- Patent Title: CANISTER FOR DEPOSITION APPARATUS, AND DEPOSITION APPARATUS AND METHOD USING THE SAME
- Patent Title (中): 沉积装置用吸水装置及沉积装置及其使用方法
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Application No.: US14318086Application Date: 2014-06-27
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Publication No.: US20140308445A1Publication Date: 2014-10-16
- Inventor: Heung-Yeol Na , Ki-Yong Lee , Jin-Wook Seo , Min-Jae Jeong , Jong-Won Hong , Eu-Gene Kang , Seok-Rak Chang , Tae-Hoon Yang , Yun-Mo Chung , Byung-Soo So , Byoung-Keon Park , Ivan Maidanchuk , Dong-Hyun Lee , Kii-Won Lee , Won-Bong Baek , Jong-Ryuk Park , Bo-Kyung Choi , Jae-Wan Jung
- Applicant: Samsung Display Co., Ltd.
- Priority: KR10-2009-0061715 20090707
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/52
Abstract:
A deposition apparatus, and a canister for the deposition apparatus capable of maintaining a predetermined amount of source material contained in a reactive gas supplied to a deposition chamber when the source material is deposited on a substrate by atomic layer deposition includes a main body, a source storage configured to store a source material, a heater disposed outside the main body, and a first feed controller configured to control the source material supplied to the main body from the source storage.
Information query
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