发明申请
US20140311574A1 Self-Aligned Deposition of Silica Layers for Dye-Sensitized Solar Cells
审中-公开
用于染料敏化太阳能电池的二氧化硅层的自对准沉积
- 专利标题: Self-Aligned Deposition of Silica Layers for Dye-Sensitized Solar Cells
- 专利标题(中): 用于染料敏化太阳能电池的二氧化硅层的自对准沉积
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申请号: US14357065申请日: 2012-11-19
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公开(公告)号: US20140311574A1公开(公告)日: 2014-10-23
- 发明人: Roy Gerald Gordon
- 申请人: President and Fellows of Harvard College
- 国际申请: PCT/US2012/065781 WO 20121119
- 主分类号: H01G9/20
- IPC分类号: H01G9/20 ; H01G9/00
摘要:
The application is directed to improved dye-sensitized solar cells and methods for making the same. In accordance with certain embodiments, dye-sensitized anodes are exposed to a vapor including at least one chemical that reacts with the catalytically active material of the anode to deposit a silica layer only on regions that are not covered with the dyes. The resulting self-aligned silica layers provide increased efficiency for dye-sensitized solar cells by reducing the leakage current from the anode to the electrolyte.
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