发明申请
US20140311574A1 Self-Aligned Deposition of Silica Layers for Dye-Sensitized Solar Cells 审中-公开
用于染料敏化太阳能电池的二氧化硅层的自对准沉积

  • 专利标题: Self-Aligned Deposition of Silica Layers for Dye-Sensitized Solar Cells
  • 专利标题(中): 用于染料敏化太阳能电池的二氧化硅层的自对准沉积
  • 申请号: US14357065
    申请日: 2012-11-19
  • 公开(公告)号: US20140311574A1
    公开(公告)日: 2014-10-23
  • 发明人: Roy Gerald Gordon
  • 申请人: President and Fellows of Harvard College
  • 国际申请: PCT/US2012/065781 WO 20121119
  • 主分类号: H01G9/20
  • IPC分类号: H01G9/20 H01G9/00
Self-Aligned Deposition of Silica Layers for Dye-Sensitized Solar Cells
摘要:
The application is directed to improved dye-sensitized solar cells and methods for making the same. In accordance with certain embodiments, dye-sensitized anodes are exposed to a vapor including at least one chemical that reacts with the catalytically active material of the anode to deposit a silica layer only on regions that are not covered with the dyes. The resulting self-aligned silica layers provide increased efficiency for dye-sensitized solar cells by reducing the leakage current from the anode to the electrolyte.
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