发明申请
US20140319606A1 SHIELDED GATE TRENCH (SGT) MOSFET DEVICES AND MANUFACTURING PROCESSES 有权
SHIELDED GATE TRENCH(SGT)MOSFET器件和制造工艺

  • 专利标题: SHIELDED GATE TRENCH (SGT) MOSFET DEVICES AND MANUFACTURING PROCESSES
  • 专利标题(中): SHIELDED GATE TRENCH(SGT)MOSFET器件和制造工艺
  • 申请号: US13870993
    申请日: 2013-04-26
  • 公开(公告)号: US20140319606A1
    公开(公告)日: 2014-10-30
  • 发明人: Anup BhallaSik K. Lui
  • 申请人: Anup BhallaSik K. Lui
  • 主分类号: H01L29/423
  • IPC分类号: H01L29/423 H01L29/78
SHIELDED GATE TRENCH (SGT) MOSFET DEVICES AND MANUFACTURING PROCESSES
摘要:
This invention discloses a semiconductor power device that includes a plurality of power transistor cells surrounded by a trench opened in a semiconductor substrate. At least one of the cells constituting an active cell has a source region disposed next to a trenched gate electrically connecting to a gate pad and surrounding the cell. The trenched gate further has a bottom-shielding electrode filled with a gate material disposed below and insulated from the trenched gate. At least one of the cells constituting a source-contacting cell surrounded by the trench with a portion functioning as a source connecting trench is filled with the gate material for electrically connecting between the bottom-shielding electrode and a source metal disposed directly on top of the source connecting trench. The semiconductor power device further includes an insulation protective layer disposed on top of the semiconductor power device having a plurality of source openings on top of the source region and the source connecting trench provided for electrically connecting to the source metal and at least a gate opening provided for electrically connecting the gate pad to the trenched gate.
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