发明申请
- 专利标题： SPUTTERING SYSTEM AND METHOD USING COUNTERWEIGHT
- 专利标题（中）： 溅射系统和使用反射镜的方法
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申请号： US14185867申请日： 2014-02-20
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公开(公告)号： US20140332376A1公开(公告)日： 2014-11-13
- 发明人: Vinay Shah , Alex Riposan , Terry Bluck
- 申请人： INTEVAC, INC.
- 申请人地址： US CA SANTA CLARA
- 专利权人： INTEVAC, INC.
- 当前专利权人： INTEVAC, INC.
- 当前专利权人地址： US CA SANTA CLARA
- 主分类号： H01J37/34
- IPC分类号： H01J37/34
摘要：
A system for depositing material from a target onto substrates, comprising a processing chamber; a sputtering target having length L and having sputtering material provided on front surface thereof; a magnet operable to reciprocally scan across the length L in close proximity to rear surface of the target; and a counterweight operable to reciprocally scan at same speed but opposite direction of the magnet.
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