Invention Application
US20140349140A1 CXNYHZ FILM, DEPOSITION METHOD, MAGNETIC RECORDING MEDIUM AND METHOD FOR MANUFACTURING THE SAME
有权
CXNYHZ膜，沉积方法，磁记录介质及其制造方法
- Patent Title: CXNYHZ FILM, DEPOSITION METHOD, MAGNETIC RECORDING MEDIUM AND METHOD FOR MANUFACTURING THE SAME
- Patent Title (中): CXNYHZ膜，沉积方法，磁记录介质及其制造方法
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Application No.: US14351661Application Date: 2011-10-24
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Publication No.: US20140349140A1Publication Date: 2014-11-27
- Inventor: Haruhito Hayakawa , Kouji Abe , Keiichi Terashima , Yuuji Honda
- Applicant: Haruhito Hayakawa , Kouji Abe , Keiichi Terashima , Yuuji Honda
- International Application: PCT/JP2011/074457 WO 20111024
- Main IPC: G11B5/72
- IPC: G11B5/72 ; G11B5/725
Abstract:
To provide a CxNyHz film of high density and a deposition method. One aspect of the present invention is a CxNyHz film formed on a substrate to be deposited, wherein x, y and z satisfy formulae (1) to (4) below: 0.4
Public/Granted literature
- US09524742B2 CXNYHZ film, deposition method, magnetic recording medium and method for manufacturing the same Public/Granted day:2016-12-20
Information query
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