发明申请
US20140363633A1 METHODS OF REDUCING A REGISTRATION ERROR OF A PHOTOMASK, AND RELATED PHOTOMASKS AND METHODS OF MANUFACTURING AN INTEGRATED CIRCUIT
有权
降低光电二极管的注册错误的方法，以及相关的光电子元件和制造集成电路的方法
- 专利标题： METHODS OF REDUCING A REGISTRATION ERROR OF A PHOTOMASK, AND RELATED PHOTOMASKS AND METHODS OF MANUFACTURING AN INTEGRATED CIRCUIT
- 专利标题（中）： 降低光电二极管的注册错误的方法，以及相关的光电子元件和制造集成电路的方法
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申请号： US14176565申请日： 2014-02-10
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公开(公告)号： US20140363633A1公开(公告)日： 2014-12-11
- 发明人: Sang-hyun Kim , Seong-sue Kim , Dong-gun Lee , Chalykh Roman , Mun-ja Kim
- 申请人： Sang-hyun Kim , Seong-sue Kim , Dong-gun Lee , Chalykh Roman , Mun-ja Kim
- 优先权： KR10-2013-0066795 20130611
- 主分类号： G03F1/72
- IPC分类号： G03F1/72 ; H05K3/00 ; G03F1/74
摘要：
Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.
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