Invention Application
US20140366912A1 IN SITU PLASMA CLEAN FOR REMOVAL OF RESIDUE FROM PEDESTAL SURFACE WITHOUT BREAKING VACUUM 有权
在没有破裂真空的基础表面去除残留物的现场等离子体清洁

IN SITU PLASMA CLEAN FOR REMOVAL OF RESIDUE FROM PEDESTAL SURFACE WITHOUT BREAKING VACUUM
Abstract:
Methods and apparatus for in-situ plasma cleaning of a deposition chamber are provided. In one embodiment a method for plasma cleaning a deposition chamber without breaking vacuum is provided. The method comprises positioning a substrate on a susceptor disposed in the chamber and circumscribed by an electrically floating deposition ring, depositing a metal film on the substrate and the deposition ring in the chamber, grounding the metal film deposited on the deposition ring without breaking vacuum, and removing contaminants from the chamber with a plasma formed in the chamber without resputtering the metal film on the grounded deposition ring and without breaking vacuum.
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