公开(公告)号：US20140366912A1

公开(公告)日：2014-12-18

申请号：US14280201

申请日：2014-05-16

Applicant: Applied Materials, Inc.

Inventor： Richard J. GREEN ,  Cheng-Hsiung TSAI ,  Shambhu N. ROY ,  Puneet BAJAJ ,  David H. LOO

IPC: H01J37/32 ,  C23C14/56

CPC classification number: H01J37/32862 ,  C23C14/50 ,  C23C14/564 ,  H01J37/32642 ,  H01J37/32715 ,  H01J37/3408

Abstract: Methods and apparatus for in-situ plasma cleaning of a deposition chamber are provided. In one embodiment a method for plasma cleaning a deposition chamber without breaking vacuum is provided. The method comprises positioning a substrate on a susceptor disposed in the chamber and circumscribed by an electrically floating deposition ring, depositing a metal film on the substrate and the deposition ring in the chamber, grounding the metal film deposited on the deposition ring without breaking vacuum, and removing contaminants from the chamber with a plasma formed in the chamber without resputtering the metal film on the grounded deposition ring and without breaking vacuum.

Abstract translation: 提供了用于沉积室的原位等离子体清洗的方法和装置。 在一个实施例中，提供了一种用于在不破坏真空的情况下等离子体清洁沉积室的方法。 该方法包括将基板定位在设置在室中的基座上并由电浮动沉积环外接，在基板上沉积金属膜和在室中沉积环，使沉积在沉积环上的金属膜接地而不破坏真空， 以及在腔室中形成的等离子体从室中除去污染物，而不对接地的沉积环上的金属膜进行再溅射，而不破坏真空。

公开(公告)号：US20150315707A1

公开(公告)日：2015-11-05

申请号：US14267865

申请日：2014-05-01

Applicant: Applied Materials, Inc.

Inventor： Jun XUE ,  Jingjing LIU ,  Yongmei CHEN ,  Ludovic GODET ,  Chentsau YING ,  Shambhu N. ROY

IPC: C23C16/56 ,  C23C16/505 ,  C23C16/455 ,  C23C16/27 ,  C23C16/46

CPC classification number: C23C16/56 ,  C23C16/27 ,  C23C16/272 ,  C23C16/452 ,  C23C16/45523 ,  C23C16/45557 ,  C23C16/46 ,  C23C16/505

Abstract: Methods for making a nanocrystalline diamond layer are disclosed herein. A method of forming a layer can include activating a deposition gas comprising an alkane and a hydrogen containing gas at a first pressure, delivering the activated deposition gas to the substrate at a second pressure which is less than the first pressure, forming a nanocrystalline diamond layer, treating the layer with an activated hydrogen containing gas to remove one or more polymers from the surface and repeating the cycle to achieve a desired thickness.

Abstract translation: 本文公开了制备纳米晶体金刚石层的方法。 形成层的方法可以包括在第一压力下激活包括烷烃和含氢气体的沉积气体，在小于第一压力的第二压力下将活化的沉积气体输送到衬底，形成纳米晶体金刚石层 用活化的含氢气体处理层以从表面去除一种或多种聚合物并重复该循环以达到所需的厚度。